Used CANON MPA 500FA #9226311 for sale

CANON MPA 500FA is a state-of-the-art mask aligner designed for performing high-precision lithography on a variety of substrates. The equipment takes advantage of several unique features including an in-plane alignment technique, a high-speed 28nm step resolution, and a wafer thickness measurement system. The main component of CANON MPA-500FA is the aligner plate, which is responsible for coordinating the positioning and orientation of the masks. The plate is designed with an in-plane alignment technique, which allows for excellent alignment accuracy and short alignment times. The plate uses four prism-shaped posts to ensure precise positioning within the wafer chamber. A centering knob is provided for added accuracy in positioning the mask between two posts. MPA 500 FA also includes a wafer thickness sensor for measuring the exact thickness of the substrate. The sensor is mounted on the aligner plate and can be used to accurately compensate for any irregularities in the substrate that could affect the image clarity. Additionally, the unit offers a built-in registration correction mode and a two-point registration mode which allows for the adjustment of the mask alignment. MPA 500FA also includes an advanced lithography machine that features a high-speed 28nm step resolution and a high-efficiency laser patterning module. The advanced lithography tool is also equipped with a high-precision vector generator and a wavefront recognition asset for producing smaller structures with an image smoother than is achievable with traditional lithography systems. CANON MPA 500 FA is available with a variety of optical systems that can be customized to meet the user's needs. These include both reflective and transmissive optics which can be used for either contact or proximity exposure. These optics are designed to produce an image with excellent accuracy, resolution, and fidelity. MPA-500FA also includes a high-precision miniature stepper motor and gearbox, which provide precise and reliable stepping. The stepped images can be viewed using an optional microscope, which offers an expanded field of view. The model also comes with a computer-aided alignment equipment for accurate registration among multiple layers. Overall, CANON MPA 500FA provides users with an advanced mask aligner that combines high-precision lithography, an in-plane alignment technique, a wafer thickness measurement system, and a variety of optics for customizing the user's needs. The unit is ideal for producing high-resolution images for semiconductor devices and nanofabricated components.