Used CANON MPA 500FA #9226327 for sale

CANON MPA 500FA is a state-of-the-art mask aligner for the fabrication of semiconductor devices. It is designed for high-accuracy mask overlay alignment and feature registration, making it an ideal tool for lithography. TheCANON CANON MPA-500FA can accommodate wafers ranging from 0.5 inch to 12 inch or even larger in size. It features five alignment systems, including top-down optical alignment, auto detection, IC chip alignment, bottom-up optical alignment, and boundary scan alignment. With the help of image processing technology, MPA 500 FA can accurately align masks of different sizes and shapes with just a few steps. TheCANON MPA 500FA features high-precision stepper motors and servo motors for alignments, with an accuracy of +/- 2 microns. It also offers 10 levels of magnification and an easy-to-read LCD display for better visualization and operation. With extended working distance and multiple laser options, MPA-500FA can precisely align masks over large areas and for high-density applications. CANON MPA 500 FA can accommodate up to eight masks per wafer, with a maximum resolution of 0.5 nm and an alignment speed of 5.8 ms. It is compatible with the latest exposure sources and uses advanced computational lithography to effectively produce masks with high throughput and excellent image quality. For improved productivity, CANON MPA 500FA offers advanced wafer handling capabilities such as automatic handling of multiple wafers, wafer loading, unloading, and sorting. Additionally, it has a double-hear exposure apparatus, quartz heater, and a cooled stage for higher process reliability. TheCANON CANON MPA-500FA utilizes an advanced optical link design for superior stability and performance. Furthermore, its compatible with Windows 10/Windows 7 and a variety of software, providing a comprehensive suite of support to ensure high-quality lithography. In summary, theCANON MPA 500 FA is an advanced mask aligner suitable for the fabrication of semiconductor devices. It offers excellent performance, fast alignment speed, and reliable wafer handling capabilities for high accuracy overlay alignment and feature registration. With its multiple optical systems and advanced optical link design, MPA 500FA is a powerful tool for precise lithography.