Used CANON MPA 500FA #9226328 for sale

CANON MPA 500FA is a high precision automatic mask aligner that offers a highly accurate and repeatable method for optical lithography. It is designed for fabrication and testing of a wide range of 3D structures, including MEMS, microfluidics, and high aspect ratio micro- and nanostructures. It has a large working area, up to 200mm x 200mm (7.9" x 7.9"). The alignment accuracy is as high as 0.02microns (2nm) for lateral alignment and 0.15microns for vertical alignment. The alignment repeatability is below 0.01microns (1nm) for both lateral and vertical alignment. CANON MPA-500FA is designed for alignment of polyimide, chromium, and gold masks, among others. The polyimide mask alignment accuracy is 0.03microns (3 nm). MPA 500 FA features a gravity feed system, a servo drive, and a rotary encoder for precise lateral and vertical positioning. The alignment accuracy is improved by the use of laser interferometry. CANON MPA 500 FA can be programmed to align more than one mask pattern simultaneously and can be used with any light source. MPA 500FA has a light source with a wavelength range of 365nm to 647nm. Light intensity is adjustable and the exposure time is variable from 0.1ms to 1 minute. The exposure is triggered from a TTL input or from a built-in monostable device. MPA-500FA is automated and controlled through an 8-bit microprocessor. It has a variety of I/O and communication options, such as RS-232, GPIB and Ethernet. The machine is also compatible with CANON LMS-III (Laser Micromachining System). The exposure mode is semi-automatic, with exposure levels and delays determined by the user. As an optical lithography system, CANON MPA 500FA has a depth of focus of 0.15 microns or better and can handle very fine structures. Its resolution is higher than that of other mask aligners, allowing for a wider range of structures. The size of the structures that can be patterned is also larger, allowing for larger-scale devices. Overall, CANON MPA-500FA offers a high accuracy and repeatability for mask alignment and optical lithography. It is suitable for the fabrication and testing of a large range of high aspect ratio 3D structures, including MEMS, microfluidics, and small-scale devices. It provides excellent resolution and depth of focus while being easy to operate and program.