Used CANON MPA 500FA #9226333 for sale

CANON MPA 500FA is a mask aligner for the mass production of semiconductor device fabrication. It is a fully automated equipment designed to provide high levels of process accuracy and throughput. CANON MPA-500FA was designed based on a four-point exposure system using a xenon lamp. The exposure unit uses two ruby enhanced quartz halogen lamps for uniform illumination and two motorized optical de-flection systems for high-speed alignment. The machine is capable of processing up to five 1x1 or four 4x4 wafers per batch, and is equipped with an indexer for high-speed rotation and a 10-second reset time. MPA 500 FA is equipped with a high speed pattern recognition tool and image processing algorithms for alignment of wafers with nano-scale overlays. The wafer alignment is achieved by scanning a linear CCD array equipped with digital shadow mask processor. This processor is responsible for detecting and recognizing alignment marks and is capable of correcting for minute variations in the structure of each wafer. In addition, MPA-500FA is equipped with an 8-position auto-focusing asset, allowing for a high degree of accuracy in overlay measurements. CANON MPA 500 FA provides excellent overlay accuracy, up to 0.53 microns with 85nm wavelength, and features an automated process control model that produces repeatable exposure characteristics. The equipment supports a range of processes, including contact, projection, and scanning electron beam lithography. A scanner plate is used enable up to ten layers of transparent film or plates per process. MPA 500FA is compatible with most standard exposure materials and can perform at temperatures up to 105 ° C. CANON MPA 500FA is an economical solution for mass-producing semiconductor devices and can be easily integrated with existing production systems. The system provides efficient and reliable performance, and can be customized to the specific requirements of device manufacturing. The intuitive user interface and powerful features make it an ideal choice for the manufacture of highly accurate optical components.