Used CANON MPA 500FA #9226335 for sale

CANON MPA 500FA is an advanced mask aligner designed specifically for photolithography applications. It is used in semiconductor wafer fabrication processes, such as depositing and etching materials, creating intricate patterns on a wafer, and for other microelectronic applications. It has a maximum power of 175W and a maximum sensitivity of 9.0μm. CANON MPA-500FA is equipped with advanced precision components such as a True Focus Scanning Lens and a Field Alignment Feature. The True Focus Scanning Lens is an autofocus scan lens that is designed to maximize the beam's power and reduces diffraction. The Field Alignment Feature ensures the lens stays aligned with the wafer, regardless of movement, providing more consistent exposure across the wafer. MPA 500 FA also features a fully automated, multi-axis mask alignment equipment. It has an integrated auto-exposure feature capable of automatically aligning exposures to patterns of different sizes and shapes. This feature eliminates the need for time-consuming manual adjustments. CANON MPA 500 FA has an advanced projection system with Automatic Exposure Control (AEC). This unit adjusts the exposure and focus of the beam according to the pattern edge and the entire projection area. It also has onboard image processing and pattern alignment capabilities. MPA-500FA has a high-speed beam deflection machine which reduces exposure time and increases throughput. It is also capable of processing both top and bottom sides of the wafer simultaneously. MPA 500FA also has a built-in overall fault protection tool. It monitors the asset in real time and alerts the operator in the event of a malfunction to help prevent any damage to the equipment. Overall, CANON MPA 500FA is ideal for those who need to quickly and accurately create patterns on semiconductor wafers with precision. It is capable of high-speed and high-precision mask alignment, and its automated features make it easy to operate.