Used CANON MPA-600/500 #293606556 for sale

CANON MPA-600/500 Exposure Equipment is a high-powered, reliable exposure system designed for a variety of photolithographic processes. The unit is composed of an advanced multiple exposure head, an exposure controller, a high-precision mechanical stage and a vacuum table. The exposure head is equipped with two lamp shutters, precisely controlled adjustable baffle plates, and a shutter-interlock machine that ensures only one exposure is made at a time. The exposure controller is the most important component of the tool. It takes in user commands and controls the exposure process. It can adjust the position, exposure times, energy levels, and multiple exposure overlap. It also detects out-of-limits conditions and allows for special operating features. The exposure controller features automatic safety devices that stop exposures when certain pre-defined criteria are not met. The precision mechanics stage is designed to provide accurate positioning of the wafer, and ensure that it is securely held in place during the exposure process. The stage uses linear and rotary encoders to accurately measure and control its position. It can also be programmed to allow for multiple exposure-axis offsets. The vacuum table, which is located on top of the exposure controller, is responsible for securely positioning and firmly gripping the wafer during the exposure process. It is also capable of applying a uniform exposure across the entire wafer surface. The table is temperature controlled and vacuum tight, ensuring that air and moisture do not interfere with the exposure process. The MPA-600/500 Exposure Asset is the perfect solution for photolithographic processes that require precise exposure of large-size wafers. Its combination of advanced components ensures accurate exposures consistent with current industry standards. The model is thoroughly tested and trusted by the world's leading semiconductor manufacturers.