Used CANON MPA 600 FA #293606919 for sale

CANON MPA 600 FA is a mask aligner that enables the efficient and accurate transfer of physical patterns to the substrate. This device is essential when it comes to efficient photolithographic processes in the fabrication of ICs and thin film structures. CANON MPA600FA operates by using a combination of light, optical proximity correction (OPC) algorithms, and production wafer stages. First, the light source is designed to thoroughly and uniformally expose the resist film to the desired pattern size. After this step, the OPC algorithms are used to compensate for any discrepancies between the desired design and the actual pattern. Lastly, a production wafer stages offers a precision motion for creating the desired patterns. MPA-600FA is an easy to use and reliable equipment and is perfect for state of the art processing techniques. This device features the latest in modern engineering including a touchscreen monitor, multiple masking, and wafer mapping as well as advanced OPC software. This makes for accurate and efficient patterns per exposure with minimal user setup. From a performance standpoint, CANON MPA 600FA offers exceptional resolution of 0.25 microns resolution and features a standard mask size of 8"x 8". Throughput is quite impressive due to its high speed 40 msec exposure time. Additionally, the device is designed with the user in mind with a variety of conveniences such as an automatic vacuum retaining system, an automated safety check and remote control. To reduce maintenance, MPA-600 FA also provides an easy to maintain shutter unit which is designed to last for years. Finally, the machine allows for an easy upgrade of the camera machine at any time to ensure the highest throughput. Overall, MPA 600 FA is an advanced mask aligner that provides an exceptional performance while also featuring an array of conveniences designed to make the photolithography process efficient and easy to use.