Used CANON MPA 600 FA #293609496 for sale

CANON MPA 600 FA is a fully automated stepper-scanner aligner which is used in photolithography process of semiconductor device fabrication. It is a mask aligner that can accurately align a pattern defined on a photomask onto an exposed, photoresist-coated wafer. This is done by projecting the pattern from the mask onto the wafer covered with photoresist and transferring the image onto the wafer. CANON MPA600FA features an intelligent dual-area scanning system for precise registration and alignment, making it ideal for precise semiconductor device fabrication applications. It has a LED-based light source, which provides an excellent level of brightness for an enhanced design resolution and pattern fidelity. A built-in auto inspect function allows for automatically detecting an optimal alignment position. The machine's defining features include its high throughput, accuracy, and positioning accuracy. MPA-600FA has a ±6 μm laser alignment accuracy, giving it precise alignment capabilities. Additionally, the system supports a wide range of substrates, such as glass, silicon wafers and quartz substrates. The built-in auto inspect feature allows for detecting defect and small particle sizes while scanning large substrates. The system can process 8 inch to 12 inch-diameter substrates without requiring any adjustments. Additionally, CANON MPA-600FA has an opto-mechanical package that enables fine alignment by laser interferometry, providing accurate mask to wafer overlay alignment. It also has digital networking capabilities, allowing for remote control of the machine. Additionally, it supports CAD based data input for mask fabrication and design verification. The machine is ATE ready, providing integrated control between the ATE and aligner. Overall, CANON MPA600-FA is an ideal mask aligner for reliable and precise semiconductor device fabrication. With its wide range of features, flexible substrate support, and accuracy, it provides manufacturers with consistent and precise results.