Used CANON MPA 600 FA #9016131 for sale
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ID: 9016131
Wafer Size: 6"
Aligner, 6"
Oscilloscope: TEKTRONIX TDS 3012 (Auto alignment signals)
IUC Meter: IUC- M3S
Double / Single indexer
Scan motor
Auto hand turn (unlock like turn table)
LED:
For flat finder with high bearing, 6”
Observation light in alignment scope
Extension cable:
Automatic alignment PCB: 4 x 60 pin
PCB 17 / 18: 2 x 50 pin
Camera / Monitor observation system
Laser adjustment tool
(4) Spare foots
Tube for fill cushion foot
Lamp
Vacuum pump
(2) BD0-5200
BD1-3294
(2) CTC / TDC
(2) Long cables with sensor
Cover with powder coating
Light condition:
Input: 1800 W
Output: 700 mW / cm2 for 1.6 mm slit
Manual included.
CANON MPA 600 FA mask aligner is an essential tool in the fabrication of products utilizing lithography techniques. It is a fully automated machine that is designed for high-volume production and is capable of exceptionally precise patterning. The device utilizes a combination of vacuum chuck and resist coating technology to line, transfer, and develop micro-patterned features onto a variety of substrates. The equipment is equipped with both an automatic mask alignment system and an intelligent vision unit. The alignment machine uses laser positioning sensors to accurately locate the alignment marks on the substrate and enables accurate registration between the mask and layer. The vision tool is used to detect substrate defects, identify the number of frames and layers that are present on the substrate and calculate the alignment parameters. CANON MPA600FA is a modular asset capable of handling multiple substrates and masks simultaneously. The model is capable of processing a variety of pattern geometries in sizes ranging from micrometers to millimeters. MPA-600FA is capable of achieving high-precision patterns with a resolution of ≤ 8µm and a pattern deviation of ≤ 5µm. With its robust resist coating technology, the equipment is capable of reproducing even the most challenging patterns with ease. CANON MPA600-FA utilizes advanced optical alignment technology to optimize exposure accuracy and ensure uniform results. The machine is equipped with vacuum chucks which firmly hold the substrate during substrate loading, resist application and post-exposure processes. MPA600-FA also supports a wide range of resist materials to combine optical and physical properties for optimal results. With its ability to rapidly process large batches of production masks, CANON MPA 600FA can dramatically reduce lithography cycle times. Additionally, the system is capable of running offline, allowing users to complete multiple production operations at once, thus enabling higher yield rates. CANON MPA-600FA is the ideal tool for high-volume production requirements. Its combination of sophisticated features and reliable performance makes it an excellent choice for lithography and microfabrication production runs. The unit is simple to use and its closed-loop automatic alignment enables users to achieve precise results with minimal operator input. Highly reliable and efficient, MPA 600FA is a best-in-class mask aligner for lithography and microfabrication applications.
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