Used CANON MPA 600 FA #9058852 for sale

CANON MPA 600 FA is an automatic, full-wafer mask aligner. It is a tool used by advanced electronic device manufacturers to transfer patterns from a template onto a substrate or over a device's surface. The aligner is designed for precision and accuracy over a large area, making it an ideal choice for modern semiconductor production. The equipment is equipped with a large lithography area of 600mm (23.62") and a resolution of 10 nanometers (nm). It features an enhanced wavelength of 248nm and 248nm for pattern exposure and alignment accuracy. Its patented "auto-alignment" system ensures swift and accurate alignment of the substrate and template onto its mask stage. The unit includes four main components: 1) Mask Stage: This platform positions both the template and the substrate over the lithography area, ensuring repeatable precision. Its transfer range is 300mm and can be adjusted to accommodate different substrate sizes. 2) Illumination Machine: The illumination tool of CANON MPA600FA provides ultra-high brightness for uniform exposure using an advanced light source. It can generate high resolution imaging of around 10nm, making it ideal for fabrication of high-density patterns on semiconductor substrates. 3) Alignment Asset: This model provides advanced alignment accuracy and control with its accurate angular bisector and actuator equipment. It enables wafer-level alignment and adjustments to ensure maximum exposure accuracy. 4) Z-Axis Unit: The Z-Axis Unit maintains the height of the mask structure for ease of adjustability. It also provides the best possible accuracy of the mask registration via independent edge control and auto-alignment. MPA-600FA is a powerful tool for any advanced technology production and is designed to deliver high-precision pattern transfer. Its advanced illumination, alignment, and precision systems, together with its large lithography area, make CANON MPA 600FA an ideal choice for high-precision production of electronic devices.