Used CANON MPA 600 FA #9144946 for sale

CANON MPA 600 FA is a state-of-the-art mask aligner that is used for photolithography and wafer patterning. This type of aligner enables the creation of precise patterns to be used in semiconductor chips, MEMs, LEDs, and nearly any types of microfabrication. CANON MPA600FA features a 320 mm substrate size, highest optical accuracy, high resolution, high precision, and high productivity. Its speed is also increased due to high accuracy of its 5-axis motion control equipment. The machine's high precision ensures that the patterns can be replicated accurately in every single step of the fabrication process. The 5-axis motion control system also improves the accuracy and provides real-time feedback for adjusting the process. It is designed with a Proprietary Diffractive Optical Element (DOE) Technology for improved image placement accuracy in photolithography and wafer patterning. The DOE technology utilizes a set of very precise optics, which help to create patterns that can be duplicated very accurately from one wafer to the next. MPA-600FA has a high-resolution color digital LCD monitor, which provides the user with an easy to use interface to monitor the entire operation. Additionally, it comes with an integrated laser alignment unit for quick and accurate substrate placement. This machine allows the user to align the chip pattern to the mask in a single step and then to replicate the position of the pattern multiple times. MPA 600 FA also comes with several automatic functions including multiple passes scanning, wavelength selection, and exposure optimization. These functions improve the overall efficiency and precision of patterning. Overall, CANON MPA-600 FA enables microfabrication of high quality micro-patterns and increases the throughput and accuracy of photolithography and wafer patterning. Its features make it an ideal choice for advanced photolithography and wafer patterning applications.