Used CANON MPA 600 FA #9148243 for sale

CANON MPA 600 FA is a state-of-the-art mask aligner designed for use in semiconductor device fabrication. It is equipped with a number of advanced features, such as high alignment accuracy, superior throughput, and a wide range of processing capabilities. The device is used to align a photomask to a semiconductor wafer, allowing for the fabrication of intricate, precise patterns. CANON MPA600FA features a two-dimensional air-bearing design that uses air to lift the photomask and wafer off the table, ensuring maximum stability while rapidly moving both components in a precise, coordinated fashion. This 2D air bearing design ensures that the alignment accuracy of the process is extremely high. The linear accuracy is measured in the sub-micron range, enabling precise alignments to be made with minimal effort. The mask aligner is also equipped with a scanning laser system and highly sensitive optics. The laser system projects a precisely targeted light beam onto the photomask and the wafer, allowing for accurate alignment even with minute patterns. Additionally, the advanced optics allow the user to view the entire wafer at once, giving them a comprehensive view of the results of their alignment process. MPA-600FA is capable of operating at speeds of up to 600 frames per second, providing an excellent throughput when producing chips. Additionally, it is compatible with a range of film and laminate photomasks, allowing for the alignment of a variety of patterns and sizes. This device also features high resistance against mechanical shock, making it well-suited for use in various fabrication environments. Finally, MPA 600 FA is outfitted with a slew of software features, such as an intuitive graphical user interface and a wide range of analytical tools for post-alignment analysis. These features round out the device, making it one of the most comprehensive and advanced mask aligners currently on the market.