Used CANON MPA 600 FA #9200847 for sale

CANON MPA 600 FA is an advanced mask aligner for micro- and nano-patterning of substrates. It is designed to enable high-precision fabrication of electronic devices and nanostructure substrates. The equipment utilizes an X-Y stepper-motor drive unit to accurately position a substrate relative to a reticle (mask) with nanometer control. The reticle is mounted in a glass chuck, which is adjustable up to +/- 18mm in both the X and Y directions. A built-in laser interferometer measures sub-micron position changes of the chuck compared to known reference points. This feature ensures extremely accurate alignment and provides consistent registration, making the system ideal for critical applications. CANON MPA600FA employs an advanced contact exposure method to ensure high-resolution printing with a minimum feature size of 0.3 microns. The unit's advanced optical machine allows for variable focus and adjustable optical filters for improved image quality. The optical path consists of a condenser, pupil and objective lenses, all of which are optimized for optimal optical performance and modified by changing the intensity and section of light during the exposure process. The quartz reticle-holder is designed to minimize particle contamination and minimize positioning errors for the highest quality lithographic images. MPA-600FA is equipped with a dedicated 400W Nitrogen radiant furnace that simplifies the annealing process during the micro-patterning process. It employs automatic temperature control and an adjustable oxygen flow rate for precise temperature profiling. In addition, the tool is capable of handling large substrates up to 300mm in diameter. The asset is equipped with a comprehensive model software package for recipe-based equipment control. It simplifies programming and enhances productivity. The software enables automated alignment, exposure and development, allowing users to focus on their research instead of tedious system operation. MPA-600 FA is an advanced mask aligner that provides nanometer precision and superior lithographic image quality. It is easy to operate and can be used for a variety of micro- and nano-patterning applications.