Used CANON MPA 600 FA #9250757 for sale

CANON MPA 600 FA is a state-of-the-art mask aligner from CANON that offers advanced capabilities for electron beam lithography. The device is capable of achieving high resolution imaging with uniform patterning across a variety of substrates. It features a high-precision scanning electron microscope with a motorized xyz stage to provide superior contact alignment and low distortion for each layer of the developed mask. The software equipment includes an easy-to-use interface for user-defined layout designs and offers a wide variety of tools for aligning the masks accurately. The system is compatible with a variety of film and resist materials, and has a resolution down to 0.5 μm for high-precision patterning. The unit also comes with a wide range of features for device testing and verification, such as an auto-tuning wafer stage and an automatic photo stance monitor. The tension on the scoop, the installation of wafer probes, as well as laser scribe reference lines, can all be automatically adjusted, allowing for precise mask alignment. Additionally, the high vacuum environment within the chamber prevents environmental factors from influencing the optical path of the electron beam. The device has a high throughput capacity and is easily integrated with a factory automation machine. It is designed to yield high yield rates and provide consistent results when high-throughput lithography is needed. It can accommodate substrates up to 8 inches in size, and also comes with a stepper motorized stage for accurate steps in the developing process. Overall, CANON MPA600FA is a powerful and user-friendly mask aligner that delivers precise patterning with high throughput and fast turnaround times. Its flexibility and accuracy make it perfect for both prototypes and high-volume production runs.