Used CANON MPA 600 FA #9316593 for sale

Name: CANON MPA 600 FA
Brand: CANON
SKU: 9316593
Availability: SoldOut

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Mask Aligners

Manufacturer

CANON

Model

MPA 600 FA

ID: 9316593

Wafer Size: 5"

Mask aligner JEIDA Flat-finder, 6" Wafer chucks Astigmatism: < 2.0 µm Method: Measure vertical and horizontal Focus: < ± 2.0 µm Method: Deviation using tilting mask Uneven focus: < 2.0 µm Intensity: > More than 400 mW Method: SLIT 1.6 mm Uniformity: < ± 3% Method: 11-Points measure integrated intensity in CANON IUC-M3 Distortion: [MX] ≤ 0.4 µm, [MY] ≤ 0.4 µm, [DR] ≤ 0.3 µm 3σ ≤ 0.5 µm Exposure performance: Exposure field: R 95 mm Resolution: 1.8 - 2.0 µm Exposure wavelength: 365 nm (L), 405 nm (H), 436 nm (G) Line complex wavelength Reduction ratio: x1 D.O.F: ± 8 um (1.8 - 2.0 µm Line and space) Illuminator: Light source: 2.0 kW Super high pressure mercury lamp Wafer alignment: Alignment light source: He-Ne Laser (633 nm) Alignment system: LBS (He-Ne Laser scan AA) Alignment accuracy (3δ): ≤ .60 µm Scanning mechanism: Scan drive unit: Scanning carriage unit by DC motor drive Scan range: 6" (160 mm), 5" (141 mm), 4" (119 mm) Scanning speed: 5 to 150 sec (25 mm/sec - 0.83 mm/sec) Alignment scope: Viewing scope light resource: New style LED type Erector lens: Viewing lens: Manual moving Erector: 1x, 2x, 3x Mechanical pre alignment: Pre alignment accuracy (Range): Φ 100 µm or less Power supply: 200 VAC.

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CANON MPA 600 FA is a high-precision mask aligner designed to provide reliable and accurate lithographic patterns for electronic devices. It features an advanced alignment equipment and intuituve user interface, making it easy to operate. The system provides extreme accuracy with its ultra-high accuracy positioning unit and auto-alignment feature. The automated processing features enable the user to create complex and precise pattern layouts. CANON MPA600FA has a maximum effective area of 600mm x 600mm and a resolution of 0.25 microns with a focus accuracy of 0.1 microns. It is capable of high-resolution pattern generation and exposure with 8-bit gray scale. It utilizes a PUV-U light source which provides a clean, uniform polychromatic light beam. Additionally, it features an automatic pattern creation function (APC) which enables the user to utilize a wide range of mask patterns and create complex patterns quickly. MPA-600FA is equipped with a variety of accessories that enable automated alignment, positioning and exposure. It has a pneumatically actuated focus control that allows fine tuning of the imaging machine. A mirror alignment stage enables precise placement of diffraction gratings and curved mirrors for mask alignment and focus stabilization. The integrated imaging monitoring camera ensures that the pattern being viewed is accurately positioned. Additionally, the tool supports both dry and wet development processes. CANON MPA-600 FA has an integrated software package that allows the user to program operations and monitor the various components of the asset. It is also capable of communicating with external networks for automated production and control. It is capable of producing various types of patterns, from standard line patterns to complex shaped patterns. In addition, the model supports the design and verification of lithography processes such as OPC (Opto-Printing Check). Overall, MPA 600 FA is a high-precision mask aligner that provides reliable and accurate lithographic patterns. It offers the user extreme accuracy and flexibility which make it the ideal equipment for creating lithographic devices.