Used CANON MPA 600 Super #293606918 for sale

CANON MPA 600 Super is an advanced mask aligner that is used in the manufacture of integrated circuits. It is capable of aligning a wide range of materials with a high degree of precision. The features that make CANON MPA600SUPER so powerful include a microscanner with a resolution of 5 nanometers, multiple exposure sources, and a highly accurate closed-loop registration equipment. MPA-600SUPER is a fully automated mask-aligner system that can be used to align different kinds of mask materials including metal, polyimide, and quartz. It uses a microscope scanner with 5 nanometer resolution that ensures accurate alignment between the mask and the wafer. CANON MPA-600SUPER can be used in the production of various types of chips, including logic, memory, and high-speed processor chips. It is designed for both mass production and prototyping, with a throughput of up to 25 wafers per hour. The multiple exposure sources available on the machine, including a UV light source, make it suitable for multiple types of lithography applications, including contact, projection, and front- and back-end processes. MPA 600 Super includes a closed-loop registration unit that is used to accurately align the mask and wafer. The registration machine is composed of two sets of optical encoders and a linear encoder that works in conjunction with the microscope scanner to precisely register each position of the mask and wafer relative to each other. This ensures that the position of the mask relative to the wafer is precise, which is essential for repeatable lithography processes. In addition to its advanced mask-aligning capabilities, CANON MPA-600 SUPER also offers a variety of other features, such as an integrated exposure tool, auto-focus and auto-calibration, and a self-correcting auto-alignment asset. The exposure model can be used to quickly and accurately expose the wafer to the required parameters, while the auto-focus equipment helps ensure that the exposure parameters are continuously kept in line with the intended exposure. MPA-600 SUPER can be used to produce a wide range of chips in high volumes. Its compact design makes it well-suited for research and development projects, since it can be quickly deployed to a laboratory or production line. Its 5 nanometer resolution, high throughput, and precise alignment system make it a powerful mask-aligning solution.