Used CANON MPA 600 Super #9055549 for sale

CANON MPA 600 Super is a mask aligner designed for high precision photolithography in the semiconductor and related industries. It is used to fabricate high resolution microstructures and is an important part of many production processes. The equipment utilizes an advanced four-quadrant mask feature for superior alignment accuracy and high productivity. CANON MPA600SUPER is powered by an independent, high precision alignment system and high-speed algorithms. It offers a two-degree of freedom alignment unit, ensuring high accuracy alignment of masks and wafers even with asymmetric patterns or different grid sizes. The machine also features a sub-micron photomask size detection capability for very small alignment targets. MPA-600SUPER's vacuum chuck offers excellent substrate holding capability and excellent flatness even when processing large substrates. The tool's high-performance projection optics and laser-assisted pattern alignment provide low-cost, high-precision exposures. The asset also offers automated alignment and exposure control functions, making it easier and more efficient to process complex patterns. CANON MPA-600SUPER also features several safety and environmental features. It utilizes a built-in laser safety interlock model to prevent accidental exposure to dangerous wavelengths. Air flow sensors also monitor the air quality around the unit and shut down the equipment if an unsafe condition is detected. Finally, CANON MPA-600 SUPER is an extremely reliable system. Its advanced fault detection and automatic recovery features ensure efficient and long-term operation. The unit offers low maintenance costs due to its robust design and user-friendly features. In addition, CANON provides comprehensive support for all its products. Overall, MPA600SUPER is an advanced mask aligner with high precision and reliability. Its sophisticated alignment machine and safety features make it an ideal solution for production processes requiring high precision photolithography.