Used CANON MPA 600 Super #9179483 for sale

CANON MPA 600 Super is a high-precision, high-speed mask aligner produced by CANON. This device is mainly used for various mask inspection, photomask exposure and photoresist optical processing, such as optical exposure processing and optical alignment for Semiconductor device manufacturing. The basic structure of CANON MPA600SUPER is composed of four main parts: the optically laminated positioner, the master-slave configuration, the illumination equipment and the cooling system. It can be used in various wafer sizes ranging from 4-inch to 12-inch. The optically laminated positioner of MPA-600SUPER is designed to firmly hold the wafers in place for processes such as exposure to light, dust, scratches, and other contaminants. It is equipped with an optical mounting stage which is capable of accurate and precise alignment for demanding optical lithography necessary for semiconductor device fabrication. The master-slave configuration of the device is used to control the movement of the optically laminated positioner. It is an advanced mechanical control unit designed to locate the wafer extremely accurately even during the photomask exchange operations. This precision ensures accuracy and repeatability of process steps. The illumination machine installed in CANON MPA-600SUPER is made of high-powered xenon lamps and DUV Deuterium light sources. The light source provides uniform and reproducible exposure intensity across the whole area of the photomask and is ideal for even complex lithography patterns with multiple levels of resolution. The device also has a cooling tool integrated in it to maintain the temperature of the plasma chamber within the operating range. This helps to provide stable process conditions throughout the exposure process. Overall, MPA600SUPER is an integrated asset providing a stable platform for mask inspection, photomask exposure and photolithography processes. It is an ideal solution for the semiconductor fabrication and testing processes.