Used CANON MPA 600 Super #9236511 for sale

CANON MPA 600 Super is a mask aligner that is used for aligning masks with the corresponding substrates. The machine enables precise exposure and transfer of patterned metal film and provides excellent performance for manufacturing micro components in various electronic and optical devices. The mask aligner is easy to use and maintain with its intuitive operation and design. CANON MPA600SUPER features a high-power UV LED illumination system, as well as a dual-beam imaging system. This facilitates its excellent overall performance and allows for more accurate alignment. The scanning and imaging system has a large imaging area of up to 8 inches in diameter and uses two quartz lenses with three separate sets of lenses for imaging, scanning, and alignment purposes. This allows for improved resolution and accuracy when transferring images from the mask onto the substrate. The machine also features a high-precision chuck which ensures precise handling of substrates and masks, even when the substrate is not perfectly flat. In addition, the machine offers a variety of exposure parameters, including exposure time, intensity, and direction. This allows for more precise control over the alignment process and enables higher accuracy when transferring images from the mask onto the substrate. MPA-600SUPER also includes a variety of additional features, such as auto programming, automatic mask alignment, and memory for storing up to 8 pre-programmed alignment patterns. This allows for more efficient operation and provides automated solutions for more complex alignment tasks. Furthermore, the machine provides the ability to monitor alignment in real time via the use of a digital microscope. This allows for more accurate alignment and reduces operator errors. Overall, MPA600SUPER provides excellent performance and accuracy for mask alignment and image transfer tasks. Its intuitive design and operation make it relatively easy to use and maintain, while its additional features provide automation and improved control over the alignment process. As such, this mask aligner is an ideal choice for those looking to transfer micronscale patterns from masks to substrates.