Used CANON MPA 600 Super #9240097 for sale

CANON MPA 600 Super is a piece of sophisticated microfabrication equipment used in the production of semiconductor devices. It is a mask aligner, meaning that it is used to precisely align and expose photomasks onto wafers coated with photoresists. CANON MPA600SUPER has a an optical magnification of 40X to 100X, an accuracy of better than 30nm, and 4-dimensional alignment capabilities (X, Y, θ, and Z). This allows the mask aligner to perform alignment of the photomask with nanometer accuracy over a wide field of view. To ensure an accurate alignment and uniform exposure, this machine is equipped with a high precision stage, diffraction limited lenses, beam splitting, and an original optical beam aperturing for aberration correction. MPA-600SUPER also utilizes digital line/space imaging technology that corrects alignment errors and doubles line/space resolution. Additionally, this machine is equipped with a high intensity mercury-halide light source. This allows for high-throughput exposure and a short overlapped exposure time for high-definition imaging. MPA 600 Super also offers advanced wafer handling, including a wafer management system that uses a wafer stage deformation control mechanism, a wafer suction mechanism and an auto-elevation system designed to minimize contamination. This machine also offers advanced safety features like an anti-reflection glass and a reflected light sensor the detect the presence of any materials on the photomask. MPA600SUPER also has precise control of exposure dose and an automatic shutoff system that ensures the prevention of overexposure of the photomask. Together, these features make MPA-600 SUPER an ideal tool for producing a wide range of semiconductor devices with very high precision and reliability.