Used CANON MPA 600 Super #9286630 for sale

Manufacturer
CANON
Model
MPA 600 Super
ID: 9286630
Vintage: 2001
Mask aligner 2001 vintage.
CANON MPA 600 Super is a mask aligner that is used for precision patterning and alignment. It is a fully automated, next-generation platform designed to enable the production of high-precision devices with superior edge acuity. CANON MPA600SUPER features a new full field lens free imaging process that enables high-resolution imaging even with thick patterns and complex geometries. This combined with new advanced pattern recognition technology results in an extremely precise alignment capability with a repeatable accuracy of 1.5 µm. MPA-600SUPER also features an advanced non-contact substrate handling equipment that eliminates substrate damage, resulting in improved yields. The multiple-axis design provides improved throughput and flexibility, allowing for complex patterns and geometries to be easily engaged and accurately patterned. The system tool stack allows for a wide range of tailoring options to suit a variety of applications. MPA-600 SUPER has a maximum substrate size of 600mmx500mm, and can be configured with a variety of mask formats, ranging from 251mm to 610mm. The unit features a variable pressure loading capability with integrated auto-focusing. This ensures that the substrate is loaded with the correct pressure and the optics remain consistent throughout the entire process. The machine also features an integrated mask stage for accurate mask alignment. This makes it ideal for creating large or complex patterns. MPA600SUPER is equipped with a full suite of software to support patterning and alignment. It features an advanced PC interface and both auto and manual patterning capabilities. The user-friendly software allows for quick and easy operation of the tool. In addition, CANON offers a variety of additional tools to customize the asset to fit the specific needs of each customer. Overall, CANON MPA-600 SUPER is a powerful mask aligner that can be tailored to meet the needs of any precision patterning and alignment application, due to its high resolution imaging capabilities, advanced non-contact substrate handling model and tool stack, and user-friendly software.
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