Used CANON MPA-7500 #293755831 for sale

CANON MPA 7500 Mask Aligner is a device specifically designed for the alignment, exposure and development of photomasks used in photolithographic applications. The Mask Aligner offers high precision and speed of operation, made possible through the use of its wide range of features. The Mask Aligner is equipped with a wafer chuck and a motor-driven adjustment equipment both of which enable the alignment of the mask and wafer with a very high degree of accuracy (0.001mm). The Mask Aligner is also equipped with a digital camera for imaging the alignment of the mask-wafer pair and allowing for corrections to any misalignments. MPA 7500 also features a CDRH-4 exposure unit for producing photomasks of consistent quality. This exposure unit is driven by an X-Y stage and is capable of producing masks with optical densities in excess of 1.5, giving repeatable exposure and ideal CD uniformity. The X-Y stage is also integrated with the motor-driven alignment system, allowing finer adjustments and nanometer-level alignment accuracy. CANON MPA 7500 also offers various types of post exposure measurement systems such as CD-SEM and Wafer Mapping, allowing for precise post-exposure diagnostics. The Mask Aligner is also equipped with an impressive variety of safety features including a safety shutter unit and an automatically controlled ozone filtration machine that prevents the ozone produced during lifting steps from escaping the device, ensuring user safety. In sum, MPA 7500 Mask Aligner is an excellent device for producing complex photomasks with unparalleled accuracy and speed. Its unique features and impressive safety features make it the ideal choice for precision lithographic applications.