Used CANON PLA 500 FA #163550 for sale

CANON PLA 500 FA is a high-performance automated mask aligner that has been designed for speed, accuracy, flexibility and reliability. This machine is capable of imaging a variety of substrates including silicon, glass and titanium. With its combination of 3D alignment, high-resolution imaging and precise imaging control, CANON PLA 500FA enables production-level throughputs in the automation of high-volume photomask production processes. PLA 500 FA consists of several core components, such as the main chassis, a laser scanner, an image processor, four high resolution alignment cameras, an alignment reference table, and a pair of high-speed servo motors. The laser scanner is used to capture high-resolution images of the substrates, allowing precise alignment of the photomask with the target substrates. The four alignment cameras create a 3D image of the substrate and photomask, which allows precise, automated alignment of the aligner's components. The reference table ensures accurate positioning of the aligner's components for each scan. Finally, the two high-speed servo motors provide precise, automated motion for the substrate and mask positioning. With these components, PLA 500FA has two main operating modes: manual and automatic. In manual mode, users can manually control and adjust the position of the substrate and photomask. This mode allows users to fine-tune the alignment of the substrate and mask for precision imaging and precise dimensional accuracy. In automatic mode, the machine uses its alignment cameras and other components to position and align the substrate and photomask without user intervention. In addition, CANON PLA 500 FA also possesses a number of user adjustable settings such as scan size, laser irradiance and mask focus. CANON PLA 500FA is designed and manufactured to the highest standards. The machine's components, such as the laser scanner, image processor, and alignment cameras, are manufactured from reliable and durable materials, ensuring accuracy and precision for long-term use. Its consistent performance and high throughputs make it a great option for photomask and substrate imaging for a variety of high-volume production processes.