Used CANON PLA 500F #131142 for sale

CANON PLA 500F is a fully automated mask aligner designed for research institutions and production lines. It is used for a variety of wafer applications including photolithography, thin-film deposition, etching, pattern recognition, and thin-film alignment. The main components of PLA 500F are a Control Console, an Exposure Unit, an Exposure Unit 2, an Assign Handler, and a Support Unit. The Control Console is equipped with a large graphic color display and provides a variety of options and functions for controlling the equipment. It contains user-friendly software for easy control and use. The Exposure Unit is equipped with a 6 inch dia stepper motor that is capable of providing 0. 25μm step resolutions. The Exposure Unit 2 is a high-speed, thin-film deposition unit that is designed for narrower processing domains. Its 16 inch dia stepper motor allows for an improved resolution of 0.03µm. The Assign Handler is a fully-automatic switching unit that links the Exposure Unit and Exposure Unit 2 with the Control Console. It is used to control the alignment and transfer of the thin-film patterns to the wafer surface. The Support Unit is a stepper motor driven mechanical device that is capable of manually picking and placing wafers onto the processed areas of the machine. CANON PLA 500F is compatible with a variety of thin-film and resist types and is capable of processing up to 150mm wafers. It features state-of-the-art pattern recognition software, which enables the system to accurately align and transfer the thin-film patterns to the substrate. The unit also allows for interchangeable filters, which provide a wide range of thin-film thicknesses. In addition to its high accuracy, PLA 500F has a fast process turn-around time and is designed for low maintenance. CANON PLA 500F is user friendly, reliable and highly accurate. It features a simple touch-screen interface with easy-to-use functions and settings. This allows the user to quickly set up and control the entire machine. PLA 500F is extremely versatile and offers a range of options to meet most production and research needs. Its high accuracy and reliability makes it an ideal choice for any wafer processing application.