Used CANON PLA 501 F #293591834 for sale

CANON PLA 501 F is a state-of-the-art mask aligner designed for applications in semiconductor device and integrated circuit (IC) fabrication. It offers a range of features and performance characteristics that make it an ideal choice for fabrication processes including photolithography, photomasking, etching and more. CANON PLA-501F is designed for efficient device and IC production, with a large working area, a fast alignment rate, and precise and repeatable alignment accuracy. The equipment uses a high power alignment laser and incorporates a full scanning motion for ultra-fast alignment, and features a closed-loop focus-error detector that ensures accurate results every time. PLA 501F supports photomask sizes up to 8" x 10", and the system's large working area allows for flexible design and tooling options. The unit has a fast, precise alignment rate of up to 1,200 wafers per hour, and an alignment accuracy of ±7 µm (±1 µm within 10 µm field) at a mask pitch of 1.5 µm. CANON PLA 501F offers high-quality results, with exposure quantification of 0.1µm precision. PLA-501F also offers variable exposure time and multiple resolution levels for different mask patterns to produce high exposure quality and reliability. Additionally, the machine features advanced features such as static alignment and the ability to accommodate different mask heights, thicknesses, and sizes. PLA 501 F also features a control interface, allowing users to customize and set layouts, parameters and more. Finally, CANON PLA 501 F also integrates services including mask pre-aligner data transfer, end-of-line assessment, and post-exposure tool verification, to ensure optimal results for fabrication processes. In short, CANON PLA-501F is a powerful and reliable mask aligner offering high quality performance, fast alignment rates, and flexible working area options. It is an ideal choice for various photolithography, photomasking, etching and other device and IC fabrication processes.