Used CANON PLA 501 F #293604248 for sale

CANON PLA 501 F is a mask aligner designed for the production of photo masks used in IC fabrications. It features a flexible alignment auto-mechanism and a high resolution image input equipment with three methods of positioning. The desired mask patterns are drawn directly on the reticle and read by the mask aligner, which then produces a photo mask of the same pattern at three times the resolution of the reticle. The aligner is capable of producing inner or outer layer photo masks with a maximum size of 600 mm and a minimum line width of 0.1 μm. The alignment is supported by the linear guide mechanism and high precision stepper motor system. It delivers a maximum resolution of 4 μm, an accuracy of 0.5 μm, and an alignment speed of 100 μm/sec. The flexible alignment auto-mechanism improves the mask-to-mask alignment precision of the device, as well as its mask transfer yield. The unit uses an internal alignment grid which can be adjusted to match the resist image. This grid is used to accurately position the mask onto the wafer, with an accuracy of 40 μm. The high resolution image input machine is used to read the masked layer of the photo mask, allowing for a maximum image read of 30 µm. The tool supports manual input and output, as well as automated via communication interface. The communication interface supports the exchange of job data and DSTEP/APPL formats for mask artwork. The device is able to support 200mm and 300mm wafer platforms, is highly flexible and can easily be configured, calibrated and maintained. The interface software is easy to use and provides complete job management. The device is able to support a wide range of production processes, including front-end and back-end, making it suitable for various applications such as IC fabrication, photomask production or semiconductor device repair.