Used CANON PLA 501 F #293830593 for sale

CANON PLA 501 F mask aligner is a top-of-the-line device used for high-precision micro-fabrication in industries such as photonics, electronics and optics. The aligner has been designed with an automated and intuitive digital interface, making it ideal for high-volume, high-accuracy production and research. CANON PLA-501F features a platform of 12.5 cm (4.9in) with a large aperture for mask placement and exposure. The robust exposure chamber accommodates masks up to 8.3 cm (3.3in) for wafer exposure, allowing for the precise production of very small feature sizes. The device uses the exclusive CANON Positioning Control Equipment (PCS) for precise and accurate mask placement. This system combines proprietary sensing, advanced robotics and innovative machine vision technology to ensure that the masks are in their exact position when the exposure cycle begins. PLA 501F provides a reliable and repeatable performance, with repeatability level of ±1.5µm. This ensures that the exact same device settings are used for every exposure cycle. The device also features a patented on-board computer and programmable logic unit. This enables users to create, store and monitor multiple exposure recipes, allowing for a wide range of exposure settings and performance metrics, optimized for various micro-fabrication processes. PLA-501F is equipped with a high-resolution Class 1 laser projection machine, featuring up to 1024x1024px resolution. This tool enables the user to project complex micro-structures that may require the highest resolution possible. Finally, PLA 501 F has a very low noise and thermal output. This feature minimizes production disruptions, and allows for long working hours without worrying about the mask aligner's performance. All of these features make CANON PLA 501F the ideal choice for high-precision micro-fabrication and optimizing production processes, with reliable and consistent performance for years to come.