Used CANON PLA 501 F #9121428 for sale
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ID: 9121428
Wafer Size: 4"
Vintage: 1998
Mask aligners, 4"
Currently non-operational
1998 vintage.
CANON PLA 501 F is an advanced photolithography stepper machine that utilizes a precise mask aligner to create integrated circuit patterns at the sub-micron level. It is designed for high-precision, continuous-flow processing and is capable of producing miniscule patterns and circuit designs with high accuracy and uniformity. CANON PLA-501F utilizes a step-and-repeat alignment technology to ensure each pattern is consistently applied with a high degree of accuracy. This system employs laser-marking techniques which help facilitate the efficient and predetermined placement of patterns in the chip design. The stepper's optical components provide a high-resolution image that is delivered to the mask stage and projected at the precise spot needed to create the desired pattern on the substrate. This ensures that each design or pattern element is accurately placed every time. PLA 501F offers a high degree of automation with multiple process control functions. Its software package enables the user to program and control settings such as exposure time, dose, and focus settings. Additionally, it can store multiple wafer recipes that are used for batch processing. In addition, the machine can be interfaced with external data communication systems and its LabVIEW software enables the user to monitor the entire system and create real-time modifications. PLA 501 F also offers reliable repeatability and precise registration. Its automated and programmable device alignment system ensures that the appropriate measurements and settings are applied to each chip pattern. This ensures that each design is replicated up to 99% of the time, achieving the highest level of accuracy and product yield. Furthermore, CANON PLA 501F's fast-scanning optics allow for a higher throughput of substrates with faster production time. PLA-501F is ideal for the production of high-precision, integrated circuit designs. Its programmable process control functions, reliable repeatability, and precise substrate registration make it an excellent choice for modern, high-volume chip production.
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