Used CANON PLA 501 F #9265301 for sale

CANON PLA 501 F
Manufacturer
CANON
Model
PLA 501 F
ID: 9265301
Mask aligner.
CANON PLA 501 F is a mask aligner which allows users to accurately and quickly align and transfer patterns onto semiconductor wafers. It is an automated semiconductor mask pattern generator, and is designed to provide precise alignment when transferring patterns composed of various layers of materials onto wafers. CANON PLA-501F can handle a wide range of wafer sizes, ranging from 5 to 200 millimeter round wafers. It also features a high-resolution optical equipment, which is capable of producing accurate and repeatable overlaid patterns. This feature eliminates the need for any manual corrections, which will ultimately save both time and cost. The machine is equipped with a digital positioning system, which enables precise alignment as well as automated registration for multiple patterns. This unit provides high accuracy in the alignment and correction of patterns onto the wafer, reducing the need for human intervention. The machine also features a wide exposing area which allows users to produce multiple patterns simultaneously. This reduces the lead time which is often associated with traditional manual mask aligners. The machine is equipped with a high-power laser diode that emits a maximum of 36mW of UV illumination, which provides extremely accurate and repeatable exposures of patterns onto wafers. Additionally, PLA 501F allows users to program a series of exposures which are then automatically executed, ensuring consistent reliable results. Its low-vibration machine that eliminates any vibration interference to the optical tool when exposing patterns onto wafers. Furthermore, the machine is equipped with a built-in power supply which ensures smooth and reliable operation throughout the entire exposure cycle. Overall, CANON PLA 501F is an efficient, reliable, and easy to use mask aligner which yields high accuracy and repeatability when transferring patterns onto semiconductor wafers. Its advanced features and design make it an invaluable tool for any semiconductor production process.
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