Used CANON PLA 501 F #9301426 for sale

CANON PLA 501 F is an automatic mask aligner designed for microlithography processes. It utilizes high-precision features such as a motorized handstage with sub-micron resolution, an ultra-low pressure contact bias, and a digital feedback loop to achieve optimal focus and alignment of mask and wafer. This helps to significantly reduce the time required for setting the mask, significantly cutting down on costs and turnaround time. Its features also include an in-built light source, a clean room collection equipment, and digital imaging systems to accurately align the mask and wafer. CANON PLA-501F's advanced optical design provides intense illumination at wavelengths between 240-330nm, allowing accurate detection of small features on the mask. Powerful electron beam technology along with a series of precision lenses and aberration testers further enhances the clarity of the illuminated mask. The system also includes sophisticated sensors and control mechanisms to maintain high accuracy and precision even in the presence of small misalignments and process variations. PLA 501F is designed to offer superior wafer-to-mask accuracy, with an automated mask-placement error of 0.001 microns per axis. This ensures that the finished microlithography products are of the highest quality. The machine has a resolution of better than 1nm, and its maximum exposure range is 8- inch square with a gap of 20mm or less. It also includes a host of other features, such as an automatic print speed of up to 8 seconds, EPC-cleaner capability for reducing chemical exposure, and a built-in laser printer to reproduce the masks in case of mistakes. PLA 501 F comes with numerous safety features, such as an intra-frame safety warning unit and touch-sensitive control panel to prevent mistakes during the alignment procedure. Additionally, the machine can be integrated with a number of other tools and equipment such as metallizers, resist printers, chill rollers, and more, to provide the most comprehensive microlithography process possible.