Used CANON PLA 501 FA #163565 for sale

CANON PLA 501 FA is a state-of-the-art mask aligner specifically designed for high precision, high throughput lithography applications. The equipment provides an optimal lithography platform for advanced manufacturing of nano-/micro-electronic devices. CANON PLA-501FA is capable of delivering stable alignment accuracy of 0.5µm across the entire substrate, providing highly accurate, sub-micron critical dimension measurements for the device patterns that are required for the next generation of integrated circuit devices. The system incorporates CANON unique projection optics technology and allows for a wide range of arbitrary chain matrices for advanced 3-dimensional mask alignment. The design features a high-precision wafer-level stage that allows for accurate sample placement as well as sub-micron repeatability. In addition, the unit is fully compatible with various resists and exposures steps, such as soft and deep UV, Iline, e-beam, and analog and digital lithography. PLA 501FA is powered by a comprehensive alignment control machine that is capable of performing up to 256,000 alignment measurements per hour. The tool uses an open-architecture algorithm to control the alignment process and provides exceptional dynamic performance for highly complex exposure processes. The integrated vision systems allow for high-precision pattern recognition, ensuring that only small details on the wafer surface are detected and accurately aligned. PLA-501 FA is able to handle two different size substrates up to 8 inches in diameter and is highly dependable, due to its low-maintenance design. In conclusion, PLA 501 FA is a powerful, reliable tool that is designed to meet the needs of nano-/micro-electronics manufacturing. The asset provides high accuracy at a high throughput rate and allows for arbitrary chain matrices for 3-dimensional mask alignment. The machine is capable of high-precision pattern recognition and allows for various resist and exposure steps. PLA-501FA is the perfect model for advanced manufacturing of the most demanding nano-/micro-electronic device applications.