Used CANON PLA 501 FA #293749121 for sale

CANON PLA 501 FA is an advanced mask aligner for use in semiconductor photolithography processes. The equipment is primarily used for wafer fabrication as well as for packaging processes. It is capable of accurately and efficiently exposing contact holes, fine line patterns and other critical features. CANON PLA-501FA is suitable for processes using deep UV (DUV) lithography, electron beam (e-beam) lithography, resist melting and heat treatment. The system features a permanent alignment unit which is accurate to within 5nm, allowing for high precision and repeatability. It is also capable of high substrate throughput and supports substrates up to 8 inches in size. The machine's mask stage is capable of moving at high speeds of up to 15.6m/s, meaning that it can accurately align and expose large areas in a short amount of time. It also supports automated post-exposure and post-bake processes to simplify workflow. The tool utilizes a three-dimensional laser focus detection processing to ensure that the alignments are precisely as required. PLA 501FA features a high-speed FPD standard transfer asset which can quickly transfer substrates without scratches or misalignment. The model is equipped with a digital field flattening equipment which ensures that is maintains high uniformity over the entire substrate without sacrificing productivity. The system is designed with a new alignment stage providing an enlarged exposure area and improved substrate flatness. It can process patterns with a minimum line width of 30 nm, making it suitable for microfabrication processes. The colour LCD user, interface allows for convenient operation and provides feedback on error correction and setup. Overall, PLA 501 FA is a reliable, precise and efficient photolithography unit. Its advanced features, productivity and repeatability make it an ideal choice for semiconductor wafer processing. It is an ideal choice for any process requiring precise, repeatable and ultra-small scale lithography.