Used CANON PLA 501 FA #293749123 for sale

CANON PLA 501 FA is a type of mask aligner most commonly used in photolithography. This tool is designed to transfer predefined patterns onto a surface or material with great accuracy. It is used to transfer circuit layouts onto semiconductor wafers, or to process photoresist materials that are sensitive to light and can be used to form the actual components of integrated circuit chips. This type of mask aligner is a compact, cost-effective solution compared to more sophisticated models and thus is typically used in research labs and academic settings. CANON PLA-501FA is a stepper, meaning it can step between exposures and one alignment step in order to maximize accuracy on very repetitive patterns. It is equipped with two high-resolution camera systems that enables precise alignment and registration. The camera systems feature autofocus and precise fine-tuning capabilities to ensure precise image alignment and image quality. The mask aligner is powered by a precision-tuned scanning optical equipment. This system uses a pair of galvanometric mirrors that are mounted to a high-precision stage. These mirrors are controlled electronically to move the scan and exposure optics accurately, displaying precise patterns on the substrate for a precise printing process. The scan and exposure unit on PLA 501FA typically have a footprint of no larger than 1300 x 1300µm for the alignment of detailed patterns. This machine includes an auto-focusing alignment tool to minimize exposure time and improve accuracy. The auto-focusing alignment asset accurately measures the focus at each exposure, constantly adjusting the beam power and eventually producing the required focus. A programmable end-stop can be programmed to ensure precise start and stop points with every exposure. The exposure of the mask can also be adjusted independently to control the shape and size of the pattern. CANON PLA-501 FA can be interfaced with a PC to facilitate the automatic loading and unloading of the substrates while maintaining programming accuracy. This aligner is also equipped with a temperature and humidity control model that keeps substrates in the right conditions during exposure. This equipment can be adapted to a variety of different substrates, some of which include resist, silicone, ceramic, glass, and plastic. This mask aligner comes with features that make it a preferred choice for microfabrication in research and educational laboratories. Its compact size and cost-effective solution make it a preferred choice for researchers who don't require the larger and more sophisticated models. With its precise optics and highly precise alignment capability, PLA-501 FA is a reliable and professional choice for photolithography and microfabrication.