Used CANON PLA 501 FA #293749124 for sale

CANON PLA 501 FA is a high performance mask aligner that is capable of providing accurate and reliable pattern alignment in photolithography processes. The device is a versatile and advanced aligner that can handle a wide range of substrates and resists. It is capable of performing both direct imaging and mask based processes with no additional equipment required. CANON PLA-501FA is equipped with a 630 mm working distance, a repeatable accuracy up to 0.2um, and a maximum wafer size of 200mm. The device also has a 12-inch active area with zoom range of at least 8x. It has a standard field size of 7.250 x 5.250 inches and an integrated auto-focus equipment to provide accurate alignment of the mask and the resist. The device utilizes G-line (430nm) and I-line (365nm) sources for exposure and has a maximum alignment speed of 0.05ms per shot. It also features direct imaging modes which are capable of providing single exposure, multi-exposure, ghost image, and ghost exposure processes. The device has an easy to use graphical user interface with flexible recipe programming, a PC remote software and a web server for system networking. It has a built-in HIAC monitoring unit for process results. Additionally, the device has a wide range of post exposure bake platforms allowing different resist thicknesses to be tested with one device. It also has a wafer alignment machine which reduces the number of masks required during the photolithography process. In conclusion, PLA 501FA is a powerful, high performance tool that is capable of performing high accuracy photolithography processes. It has a wide range of features and tools such as direct imaging, multi-exposure, G-line and I-line sources, HIAC monitoring tool, and a wafer alignment asset, making it an excellent choice for a mask aligner.