Used CANON PLA 501 FA #293757355 for sale

CANON PLA 501 FA is a mask aligner designed for use in photolithography to fabricate electrical structures. This device is used for the precise printing of complex patterned structures onto semiconductor materials including silicon and gallium arsenide. It utilizes a programmable optical alignment equipment to accurately align the photomask over the workpiece. This precise alignment enables precise printing of high resolution structures. CANON PLA-501FA is a programmable system with a wide range of settings. It can be used to adjust the exposure time, focus and mask alignment to ensure the precise placement of the photomask. This unit also includes an air bearing stage with fine and coarse alignment which can facilitate step exposure, thereby allowing the production of multi-level surface patterns. In addition to its precise mask alignment capabilities, this machine also includes an advanced exposure tool which can be used to optimize exposure dose and uniformity. It features a long exposure range, from 10mJ/cm2 to 3,000mJ/cm2, which enables a wide range of exposure requirements. The exposure asset also inclues a uniformity calibration stage, providing precise and repeatable exposure for complicated layer exposure. PLA 501FA also incorporates software that can be used to design the mask pattern. This software allows for the creation of complex and detailed structures with a wide range of optimization rules. Once designed, the pattern can be accurately printed onto the substrate, with precise alignment and exposure. PLA-501FA is a versatile and powerful model, ideal for precision photolithography. Its programmable settings, alignment accuracy and uniformity calibration, as well as its pattern design software, make it an attractive device for industrial and laboratory use.