Used CANON PLA 501 FA #293819190 for sale

CANON PLA 501 FA is a state-of-the-art, high-precision and highly automated mask aligner designed for photolithography, used for lithography and direct writing application fields. It is a fully automated equipment with a large working chamber that can accommodate and align up to 6-inch wafers by laser detection and alignment technology. CANON PLA-501FA can be used for various types of applications, such as fine-pitch mixed circuits and advanced packaging, SMD/COF/microelectronic/MEMS, OPC and reverse engraving, photomask/decal making, and flat panel display, by using a laser pattern generator system and demagnification optics. PLA 501FA is equipped with a mask stage and a chuck, which ensures high alignment accuracy and excellent repeatability. Its design includes a photonix™ linear encoder (LEN™) and a special focus control unit, to ensure a highly precise wafer planarity on any given application with high repeatability. The laser detector consists of a detector array, an electronic shutter, and a projection optics, allowing for a high-precision alignment and repeatability within nanometer accuracy. PLA-501FA comes with a user-friendly 10.4" touch screen operator panel which can be used for interactive alignment and easy operation. In addition, it is provided with in-line data handling, alignment process auto-calibration and remote machine control features, making it ideal for production line applications. PLA-501 FA is compatible with most existing lithography software applications, including CANON own Echo™ software, which can help streamline the entire lithography process from setup to exposure. CANON PLA-501 FA is an ideal choice for advanced and cost-effective lithography solutions and is suitable for multiple applications. Its excellent performance, user-friendly operation, high throughput and integration capabilities make it an excellent choice for producing high quality results and improved productivity.