Used CANON PLA 501 FA #9099865 for sale

CANON PLA 501 FA is a high-precision mask aligner machine designed for use in the production of electronics components. This machine is used for photolithography, a process that involves transferring a pattern onto a substrates for creating intricate electronics circuitry patterns. To achieve this, CANON PLA-501FA uses two beam systems, one to expose and the other to align the mask. This equipment allows for extremely precise pattern production, making PLA 501FA an ideal choice for microelectronics production. PLA-501 FA is equipped with two beams and lenses to project patterns onto a wafer. The machine has Dual Galvo scanners to align the mask, and features a Vacuum head for Holding and Mounting (TMH) the mask in its precise position. An adjustable heating system is included to protect delicate substrates during the process. The machine also features vacuum pressure control and an Automated Chucking Unit to precisely position the wafer. CANON PLA-501 FA can perform microscopic pattern accuracy up to 40nm, and projects patterns with wavelength exposures from 365 to 455nm. The machine also has a high throughput, with a processing time of 5 seconds or less for up to 12 wafers. For repeatability, the machine features a high-precision alignment tool with error correction in a 100-um area. Although this asset is complex and requires a skilled operator, it is easy to set-up and operate. PLA-501FA was designed to be extremely durable and efficient. The machine has a robust frame that can withstand large loads of wafers and other substrates. The built-in safety measures allow the operator to work without fear of damaging or overloading the model. CANON PLA 501FA is an invaluable tool for factories focused on fabrication of electronic components. Its high-precision pattern creation and accuracy make it an ideal choice for creating intricate patterns. The machine's robust design, safety measures, and efficient throughput make it ideal for any photolithography needs.