Used CANON PLA 501 FA #9159256 for sale

CANON PLA 501 FA is a full-field mask aligner that offers optimal optical performance for microfabrication applications. The mask aligner is suitable for patterning oxide layers on a wide variety of substrates including 3 - 8 inch wafers, quartz substrates, and glass substrates. The mask aligner features an overall alignment accuracy of ±0.2um, fine pixel tuning, and a high numerical aperture condenser lens that enables high-precision imaging of the mask while also maintaining a high level of contrast. The 501 FA features an eight-plate customizable auto-indexing equipment which enables accurate alignment of multiple pattern plates. The 501 FA is equipped with a state-of-the-art digital controller which provides precise control of the alignment parameters. This controller features digital pattern shift-compensations and auto-shutter control which allows for more accurate wafer exposure during alignment and lithography processes. This digital controller also allows for the adjustment of process parameters including focus, defocus, illumination, exposure, and wafer speed. The automated calibration and alignment feature further promotes precise and repeatable alignment of the mask patterns. The 501 FA is also equipped with a high-sensitivity image detection system which enables improved alignment and lithographic precision. This unit is capable of recognizing even the smallest features with a resolution of 1um or less. This image-sensing machine offers improved contrast, color-matching, and shadow control, allowing for extremely precise pattern alignment. The mask aligner is also equipped with an Erbium laser for illumination-free alignment of pattern plates. This eliminates the need for an external light source while also offering improved productivity, repeatability, and accuracy during alignment and lithography processes. The Erbium laser is also capable of precisely controlling the intensity and wavelength of the beam for optimal operation in various applications. The 501 FA is further equipped with advanced automatic safety features. These features include dust detection, chip heating control, and shutter auto-setting for improved safety during operation. The 501 FA is also equipped with a 40-point autofocus tool which delivers enhanced imaging performance while minimizing the number of manual operations required. Overall, CANON PLA-501FA mask aligner is an ideal solution for precise alignment and lithography processes. This versatile full-field mask aligner is capable of precisely controlling the alignment parameters, offering improved accuracy, contrast, and resolution for various kinds of wafer fabrication processes. The automated features, image detection asset, Erbium laser, and advanced safety features further promote safety, efficiency, and repeatability during microfabrication processes.