Used CANON PLA 501 FA #9161682 for sale

CANON PLA 501 FA
Manufacturer
CANON
Model
PLA 501 FA
ID: 9161682
Wafer Size: 4"
Mask aligner, 4".
CANON PLA 501 FA mask aligner is a type of photolithography equipment, which is a process used to transfer patterns from a mask onto a substrate. Using UV light, patterns imprinted onto the mask are exposed onto the substrate, creating a patterned film. CANON PLA-501FA is designed to provide accurate alignment of the mask and the substrate, even when there are large changes in the laying environment. PLA 501FA features an innovative optical equipment that allows for high-precision imaging of the mask and the substrate. It utilizes two 6x zoom lenses with a repeatability of 4nm and two 6x telecentric lenses with a repeatability of 1nm, providing highly precise measurements with an accuracy of up to 0.02 μm. The unit also includes an imaging system, a controller, and a wafer stage. PLA 501 FA is designed to be used in a cleanroom environment, with a contamination control unit in place. It has an air filtration rating of ISO Class 4, air speed of 0.45 m/s, and temperature and humidity levels typically between 20°C and 25°C (68°F to 77°F), and 30-70% RH, respectively. The advanced optical machine, along with the on-board alignment and imaging systems, have several functions, including: registration/alignment detection, placement accuracy, hole/film pattern detection, and dimming/pattern recognition. The imaging tool is capable of acquiring images with an effective field of view of four times the optical field. CANON PLA 501FA has a wafer stage with a diameter of 300mm (12in) and an XY accuracies of 0.02 μm, which can accommodate a wide range of substrates. It is also equipped with a built-in vision asset that provides accurate real-time hole/pattern alignment control and recognition of patterned films. CANON PLA-501 FA is a powerful production-level lithography solution that is well-suited for applications such as the creation of advanced semiconductor devices, sensors, ICs, 3D micro-structures, and other ultra-fine patterns. It provides high levels of mask alignment precision, which make it an excellent choice for professionals working in the advanced semiconductor industry.
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