Used CANON PLA 501 FA #9226071 for sale

CANON PLA 501 FA
Manufacturer
CANON
Model
PLA 501 FA
ID: 9226071
Wafer Size: 5"
Vintage: 1996
Aligner, 5" 1996 vintage.
CANON PLA 501 FA is a computer controlled mask aligner designed for processing and aligning electronic devices. The alignment accuracy of this device is designed to meet the requirements of the advanced industry, such as high-density logic integrated circuit and mixed-circuit substrates. CANON PLA-501FA can provide the required precise alignment accuracy and maximum throughput, as well as support for different substrates. PLA 501FA uses a 6-inch alignment platform with a 2.7 micron repeatability accuracy. There is a dual parametric focus equipment and a high-precision V-groove motorized stage to provide the necessary precision for substrate alignment. The aligner also features an adjustable-focus optical system which helps to adjust the focus from the top and bottom of the substrate and thereby improve the alignment accuracy. The aligner is also fitted with an automatic wafer loader for easy loading and unloading of substrates. PLA-501FA also offers a wide range of operation modes for different application. These include Red-Green(RG) functionality, Global Align (GA) function for substrates with complex wafer patterns, local align (LA) for substrates with local patterns, and multiple alignment functionalities. The advanced pattern recognition mode also enables the user to load large number of patterns in a single step. Control of PLA-501 FA is via CANON EPSOFT software. This software offers automatic substrate, pattern, and process selection, and also allows for manual input of data. The software allows for on-the-fly documentation of each process, including details of the substrate, process, and trace names, as well as dynamic updating of statistics related to substrate registration and alignment. In summary, PLA 501 FA is a computer-controlled mask aligner designed for high precision alignment and processing of electronic devices. It features a 6-inch alignment platform, 2.7 micron repeatability accuracy, dual parametric focus unit, adjustable focus optical machine, advanced pattern recognition mode, and CANON EPSOFT software. It is ideal for use in advanced manufacturing of high-density logic integrated circuits, as well as mixed-circuit substrates.
There are no reviews yet