Used CANON PLA 501 FA #9226338 for sale

CANON PLA 501 FA
Manufacturer
CANON
Model
PLA 501 FA
ID: 9226338
Wafer Size: 5"
Vintage: 1983
Mask aligner, 5" 1983 vintage.
CANON PLA 501 FA is a highly advanced mask aligner which has been designed for use in the semiconductor industry. It is used in photolithography techniques to accurately position optical masks and transfer patterns onto the substrate. The aligner offers outstanding accuracy, providing a high level of repeatability with an alignment accuracy of 50nm. CANON PLA-501FA utilizes an advanced projection microscope with a magnification of 10x to 30x which is composed of a binocular microscope, an image pickup device, a mounting stage, a beam splitter, an optical relay equipment and a telecentric lens. The microscope incorporates a unique HAD Catadioptric optical system to deliver superior contrast and resolution. The microscope also comes with an auto centering function and an autofocus to ensure the highest possible accuracy. PLA 501FA is capable of addressing different substrate materials such as glass, silicon, low-k dielectrics and ceramic substrates, as well as providing alignment onto test structures. The aligner is also equipped with an aerial imaging unit which is used to detect alignment marks on the wafers. The machine is composed of a digital camera, a stepper motor, a Z drive and a turntable actuator. PLA-501 FA has a tool controller which features a touchscreen interface for controlling the overall alignment process. It comes with a number of onboard programs which can be used to optimize the alignment process. The controller also features a comprehensive set of alignment tools which include an optical edge detection function, an asymmetric alignment function and a unique edge detection program. CANON PLA 501FA aligner is well-suited for use in high-volume production environments, due to its ability to provide high throughput speeds and an exceptional alignment repeatability. The asset is highly efficient, providing impressive cycle times of less than 5 seconds with a typical throughput of up to 250 wafers per hour. Overall, PLA-501FA is an incredibly advanced mask aligner which is capable of providing exceptional accuracy and is suitable for use in high-volume production environments.
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