Used CANON PLA 501 FA #9269096 for sale

CANON PLA 501 FA
Manufacturer
CANON
Model
PLA 501 FA
ID: 9269096
Wafer Size: 4"-5"
Aligners, 4"-5".
CANON PLA 501 FA is a compact, fully automated mask aligner specifically designed to facilitate mask patterning and lithography. This mask aligner features an integrated laser alignment equipment with five micron accuracy and fully automated alignment procedures. The mask aligner uses a dual spring stepping motor stage mechanism to accurately pattern small-volume substrates as well as larger substrates up to 6-inches in size. Additionally, the 501 FA is capable of patterning single or multiple layers of conductive and insulative materials without the need for an additional lift-off process. CANON PLA-501FA has an ultra-high vacuum system for low temperature processing as well as an E-beam source and multiple programmable exposure lenses. The dual-educational unit includes phase shift alignment and window alignment to ensure maximum accuracy when aligning features smaller than one micron. An additional small area mapping (SAM) machine allows PLA 501FA to increase pattern density on precision devices. Additionally, the mask aligner comes with a two-dimensional force sensor to automatically monitor the status of the tool and a variety of high resolution reticles including chrome and chrome on nitride. PLA-501 FA is fully automated, making it ideal for integrated circuits and other patterns requiring more precise lithography. All features of the mask aligner are automated, eliminating the need for manual operations and long setup times. Furthermore, the motorized stage has the capability to rotate 90 degrees for increased productivity and accuracy. Other features include an intuitive human-machine interface, a broad range of imaging optics, and a wide range of patterning solutions from high performance etch solutions. CANON PLA-501 FA is specifically designed for precise alignment and patterning of a variety of materials including Cu and Al layers. The tool is also capable of submicron lithography, making it ideal for a variety of masking and lithography applications. Additionally, it has built-in multiple throughputs and automated handling techniques, making it an ideal choice for budget-friendly masking solutions. Furthermore, its user-friendly interface makes it easy to program and operate, enabling it to be used by engineers at any level. In short, CANON PLA 501FA is an advanced, reliable, and easy-to-use mask aligner, providing high accuracy and flexibility for both small and large-scale lithography and patterning applications.
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