Used CANON PLA 501 FA #9289791 for sale

CANON PLA 501 FA is a mask aligner that is used as part of a lithography equipment for making advanced semiconductor devices. It is commonly found in production environments for making chips and other micro-scale electronic components. The mask aligner is capable of scribing patterns in wafers made from silicon, aluminum, and other materials at very small scales. The scribing is done using a laser which is focused through a mask - a mask which contains a pattern of the elements needed for the device. The mask aligner is then used to align the desired elements in the mask with the scribed wafer. The system consists of four main components: a scanner, a stepper, an analyzer, and a projection unit. The scanner is responsible for calibrating the optical components of the mask aligner to ensure the machine is correctly aligned. The stepper is responsible for moving the mask from one position to another over the scribed wafer. The analyzer is responsible for measuring the intensity of the laser and for detecting changes in the pattern, making corrections if necessary. Finally, the projection tool projects the mask onto the wafer, ensuring that the right elements are transferred. The asset can handle wafers up to 8 inches in diameter and is capable of achieving resolutions of 0.004 microns. It is also designed for use in a cleanroom, as it requires a clean environment to properly scribe and transfer elements. In addition, the model is capable of aligning up to 12 masks simultaneously, meaning it can quickly produce high-volume, complex devices. Overall, CANON PLA-501FA is a highly accurate, versatile, and efficient mask aligner that is capable of producing a wide variety of complex devices on a variety of materials. It is a valuable tool in production environments and allows for further miniaturization and increased device complexity.