Used CANON PLA 501 FA #9328888 for sale

Manufacturer
CANON
Model
PLA 501 FA
ID: 9328888
Wafer Size: 5"
Mask aligner, 5" Gases: N2: Maximum pressure: 3.5 kg/cm² Maximum flow: 10 LPM Pipe: SUS316 Connector: SWAG Caliber: 1/4" CDA Vacuum Mercury lamp: 250 W Wafer exposure, 5" Washing water containing organic solvent: Pipe: PP Connector: SWAG Caliber: 2" Ground: 1 ohm Manual included Power supply: 220 V, Single phase, 3-wires, 1.6 A Lamp power supply: 110 V, Single phase, 3-wires, 5.5 A.
CANON PLA 501 FA is a mask aligner manufactured by CANON Anelva Corporation. It is designed for use in various semiconductor device fabrication processes and features a high-precision, die-structured design that allows for accurate alignment of photomasks to the substrate. The mask aligner is capable of providing accurate alignment with 0.3µm repeatability and 1µm accuracy. The equipment supports a wide range of substrates, including quartz, silicon, and even GaAs, and has been designed to be highly compatible with a variety of photomasks. The system features a powerful, high-resolution optical unit that enables light-intensity control beyond 10-5 levels, fast exposure times, and simple adjustment of exposure conditions. The combination of light-intensity control, alignment accuracy, and fast exposure times that CANON PLA-501FA provides makes it suitable for a wide range of applications, including photoresist exposure, dry etching, soldering, and packaging. The mask aligner features a large, highly intuitive touch-panel control panel which allows for easy operation and adjustment. It also offers a built-in safety alert machine that will alert the user in case of any issues with the tool. Additionally, the asset features soft-start technology that reduces vibration and thermal distortion to further increase alignment accuracy. The model's advanced capabilities are enabled by a variety of hardware and software components including a high-resolution CCD image sensor, an advanced laser imaging equipment, high accuracy XYZ axes, and an integrated software suite that allows for simple adjustment of parameters including alignment accuracy, exposure time and more. Overall, PLA 501FA mask aligner is a powerful and precise system that offers excellent alignment accuracy with a wide range of substrates. It is well-suited for a variety of semiconductor device fabrication processes and offers advanced features like light-intensity control, fast exposure times, soft-start technology, an intuitive touch-panel control panel, and more.
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