Used CANON PLA 501 FA #9384106 for sale

CANON PLA 501 FA is an automated laser exposure equipment that is designed for one-step lithography processes. It is an ideal tool for advanced research or development in microelectronics devices, nanotechnology, photonics and optoelectronics. The system is comprised of two components: the projector and the stage. The projector module is a high-precision optics unit driven by a solid-state laser with a wavelength of 532 nm, controlled by stepper motors. The projector works with a high-resolution continuously scanning beam that provides a smooth focus, exposure and scan. This allows for precise lithography, with accuracy of 1µm or better. The optics module also utilizes a high-resolution optical microscope to provide live microscopic images with the lithography process for precise process control and feedback. The stage module houses the substrate, mask and an automatic alignment machine, as well as a number of other components that can be configured to enable different lithography processes. The stage comprises of a closed-loop, motion-control tool, equipped with accurate motion stages, combined with Absolute Position Registry Asset (APRS) for precise alignment. These elements allow for high-precision positioning in up to 6-