Used CANON PLA 501 FA #9396180 for sale

CANON PLA 501 FA is a top-of-the-line semi-automatic high-resolution mask aligner, designed to accurately and precisely transfer patterns written onto membrane resists onto a wafer surface. The device boasts a very powerful 10 mW He-Cd laser, allowing for the generation of consistently high-quality and high-resolution images on the wafer. To ensure that the mask is properly aligned and printed with precision, the 501 FA implements a fine-alignment system consisting of three high-accuracy micrometers, an inclined stage, and an X-Y stage. The 501 FA not only has excellent pattern resolution, but also is easy to use due to its automated features. Features such as wafer alignment, wafer clamping, and resist exposure are all automatically performed by the 501 FA. Additionally, exposure parameters can be controlled and adjusted to ensure more precise alignment and exposure. For optimum photopolymer exposure, the 501 FA utilizes 4-quadrant and 8-quadrant exposure stages which can be used separately or together. This allows for the exposure of precisely aligned patterns with a minimum of exposure time while providing superior pattern and overlay accuracy. In terms of stability and durability, the 501 FA has a rigid compact body and mainframe body with modular design, making it resistant to both vibration and temperature changes. Furthermore, its built-in cooling system maintains a consistent temperature, resulting in more consistent and reliable performance over long periods of time. To improve productivity and increase throughput, the 501 FA features a number of enhancement features such as auto-start, automatic wafer shifting, multiple-parameter storage, layer mapping, and real-time pattern alignment. In short, the 501 FA epitomizes the modern mask aligner with its cutting edge, automated features, high-resolution laser optics, and robust design.