Used CANON PLA 501 FA #97269 for sale

CANON PLA 501 FA is an advanced Mask Aligner equipment designed for photolithography applications. It is used in the manufacturing of semiconductor devices in the semiconductor industry. It uses advanced photolithography technology to linearly align a mask over a photoresist-covered substrate. It features a large area alignment mask, an extended exposure area and an enhanced alignment system. The advanced photolithography unit consists of a high intensity ultra violet light source and a projection lens. The integrated stage offers a position resolution of up to 0.5 nm and a repeatability of 0.15 μm. This unit also has a stepper motor with a drive mechanism designed to move the origin of measurement by one step. Furthermore, to enable the mask alignment it has over 100 microprocessors and four CCD cameras. The large area alignment mask of CANON PLA-501FA has a width and height of 206 mm and 170 mm respectively. This allows large area exposures and helps reduce time, thus increasing productivity. The exposure area has a diameter of 79 mm, a reinforced X beam and a holder for easy handling of parts. The advanced alignment machine offered by this Mask Aligner includes a 12-channel dead zone determining tool which accurately detects the projected pattern on the substrate. It also features a high precision alignment algorithm for more accurate alignment of structures. PLA 501FA is manufactured with a built-in high performance air shower which helps ensure clean air supply for optimal results. Furthermore, it is also equipped with a range of additional features such as automatic height detection, Z-level scan and two types of camshaft cutters. Overall, PLA-501FA is an advanced Mask Aligner designed for fabrication of high precision, high speed semiconductor devices. Its large area mask, extended exposure area and enhanced alignment asset combine to offer an accurate, fast and precise process.