Used CANON PLA 501 S #37944 for sale

CANON PLA 501 S is a computer-controlled mask aligner designed for aligning a photomask (or reticle) onto a wafer of semiconductor material. This aligner is a highly precise device that allows nanometer-level accuracy during the exposure of the photomask onto the wafer. Using an independent XYZ quartz stage and interchangeable optics, CANON PLA 501S can achieve an exposure accuracy of up to 1.5µm. PLA-501S uses a 5"diameter illuminated photomask stage, with a modular design that allows the user to choose which optics will be used for the exposure process. This unit is integrated with a high precision stage capable of X-Y scanning with a travel distance of up to 80mm and resolution of up to 1µm. Additionally, the unit is equipped with an adjustable collimator/confocal lens assembly and motorized focus equipment. The 501S also features a high-speed exposure laser system capable of a variable exposure up to 300mW/cm2 with variable frequency. The unit also features exposure patterning of up to 16 lenslets per exposure, and the exposure area can be adjusted for a wide range of substrate sizes. Safety is a primary feature of CANON PLA-501S, as the machine is equipped with laser safeties and built-in safety mechanisms to protect both the operator and the photomask. The tool is housed in a shielded cabinet to ensure there is no interference from external sources. In addition, a multi-level locking asset is included to prevent unauthorized access of the device. Overall, PLA 501S is a versatile and highly accurate mask aligner that can provide nano-level exposure accuracy for a wide range of semiconductor substrates. It is a safe and user friendly model that can be used for rapid and accurate masking techniques.