Used CANON PLA 501 #293608761 for sale

Manufacturer
CANON
Model
PLA 501
ID: 293608761
Mask aligner.
CANON PLA 501 is a mask aligner, a type of photolithography equipment used in the manufacture of microelectronic and nanoelectronic components. It is used to expose photoresist on a substrate, such as a silicon wafer, for the creation of integrated circuits, as well as for other optoelectronic and micromechanical device fabrication. CANON PLA-501 has a compact footprint and is designed to accommodate a variety of applications that require high precision and accuracy. Its integrated design allows it to fit into existing production lines or existing production equipment. It has large field of view and high resolution, two features necessary for high-accuracy chip fabrication. In addition, its high-precision vacuum chuck eliminates drift and vibration, making it ideal for small features and high aspect ratio features. PLA 501 features a 7.3-inch-wide mask, a minimum feature size of 0.25 micrometers, and alignment accuracy of 1/5,000 μm. It is equipped with a high-speed CPU and multiple sensors, allowing it to quickly scan and recognize mask patterns and accurately align them with the same speed and accuracy as with an electron beam machine. In addition, PLA-501 can be programmed to align multiple masks in a precise and uniform fashion. CANON PLA 501 also has several advanced functions, allowing it to further reduce alignment time. These include automatic centering of the mask, precise pitch control, multiple precise alignment points, precise micro-spot alignment and laser alignment, and the ability to use multiple masks simultaneously in a single process. CANON PLA-501 can also be configured for a variety of processes, including positive-tone resist applications, negative-tone resist applications, and post-exposure bake. Given its capabilities and features, PLA 501 is an ideal choice for those wishing to manufacture precise and accurate integrated circuits, optoelectronic or micromechanical devices. Its high precision and accuracy make it suitable for the most demanding applications, delivering a consistently high yield at a reasonable cost.
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