Used CANON PLA 501 #293644254 for sale

CANON PLA 501 is a mask aligner designed for photolithography applications that require high resolution, accurate mask alignment. This system has been designed for automated alignment of photomasks with great precision, allowing for a high degree of accuracy for sensitive photomask patterns. It is composed of an X-Y axis alignment table, a dual optical microscope, three reticles and a projection unit with a long-working distance imaging lens. The X-Y axis robotic alignment table drives two stick stages, each carrying the reticle and substrate with a resolution of 0.001 mm. This provides users with the ability to accurately align multiple substrates and reticles without inducing any deformation in the substrate or reticle position. Additionally, the alignment table features stage motion stability, which enables high-precision photolithography exposure without vibration. The dual optical microscope has been optimized for accurate and reliable alignment of the reticles and substrates. It consists of a high-magnification optical head with a zoom range of up to 30X. The microscope is equipped with a dual fiber optic light source, adjustable exposure control and can be easily connected to a personal computer via a dedicated USB port for remote control. The three reticles each contain photomasks with the desired pattern in them. Each mask is designed to define the shapes and materials of the devices that will eventually be printed. The most common types of reticles are binary phase shift masks, attenuated phase shift masks, alternating aperture masks and aberration-free masks. The projection unit is equipped with a long-working distance projection lens, which provides exposure of the pattern on the mask onto the substrate. It is equipped with an exposure control system (exposure control range is 0.05-32 seconds) and has a shutter speed of up to 1/1000 sec. This enables reliable and repeatable pattern transfer with high resolution. Overall, CANON PLA-501 is an exceptionally precise and reliable mask aligner that is suitable for high-accuracy photolithography applications. With its high resolution and accuracy, it enables precise pattern transfer onto the substrate with minimal distortion.